Absolute Measurements of He in Metals using Chemical Treatments

Хэвлэлийн нэр: IFOST2013 proceeding

Зохиогч:  Д.Энхзул

Хамтран зохиогч: [Ч.Батчулуун:J.ES02]

Хэвлүүлсэн огноо: 2013-07-07

Хуудас дугаар: 384-386

Өгүүллийн хураангуй:

GC/MS (Gas Chromatography/Mass Spectrometer) with the help of Chemical treatments has been applied to measure amount of helium (He) atoms in metals. A 200kV ion implantation machine was used for preparing He containing metal samples. The metal used for samples were Cu of 0.1mm thick and 0.008mm thick.  Quantitative He measurements with chemical processing were performed for these two kinds of samples. The analysis was also carried out with ERDA method for the samples of 0.008mm thickness before the measurements using the GC/MS. The GC/MS device was calibrated with commercial standard gases. Measured He contents were 12%~15 higher than those obtained by the integrated beam currents at the He implantation.

Өгүүллийн төрөл: IEEE индекстэй сэтгүүл

Өгүүллийн зэрэглэл: Гадаад

Түлхүүр үг: #He implantation #hafm #helium atoms

Өгүүлэл нэмсэн: Д.Энхзул

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